Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.

Upcoming 14A and 10A process nodes will use high-NA EUV anamorphic scanners, which will require two stitched half-fields to achieve the equivalent wafer exposure area of previous-generation scanners, ...

The self-assembly of block copolymer thin films can generate dense nanoscale patterns over large areas 1,2,3,4,5,6,7,8. When directed by a sparse topographic or chemical template, the block copolymers ...

This file type includes high resolution graphics and schematics. IC physical verification (i.e., design rule checking or “DRC”) used to be easy. In the good old days, you could run some ...

Get an overview of design patterns, then use what you've learned to evaluate whether the Composite pattern is a good choice for a particular Java use case Numerous strategies have been devised to ...